JPH0222500B2 - - Google Patents

Info

Publication number
JPH0222500B2
JPH0222500B2 JP55117429A JP11742980A JPH0222500B2 JP H0222500 B2 JPH0222500 B2 JP H0222500B2 JP 55117429 A JP55117429 A JP 55117429A JP 11742980 A JP11742980 A JP 11742980A JP H0222500 B2 JPH0222500 B2 JP H0222500B2
Authority
JP
Japan
Prior art keywords
filament
chamber
plasma
plasma chamber
thermionic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55117429A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5740845A (en
Inventor
Toshimitsu Shirota
Hisao Wakabayashi
Yasutomo Sasanuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP55117429A priority Critical patent/JPS5740845A/ja
Publication of JPS5740845A publication Critical patent/JPS5740845A/ja
Publication of JPH0222500B2 publication Critical patent/JPH0222500B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP55117429A 1980-08-26 1980-08-26 Ion beam generator Granted JPS5740845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55117429A JPS5740845A (en) 1980-08-26 1980-08-26 Ion beam generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55117429A JPS5740845A (en) 1980-08-26 1980-08-26 Ion beam generator

Publications (2)

Publication Number Publication Date
JPS5740845A JPS5740845A (en) 1982-03-06
JPH0222500B2 true JPH0222500B2 (en]) 1990-05-18

Family

ID=14711419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55117429A Granted JPS5740845A (en) 1980-08-26 1980-08-26 Ion beam generator

Country Status (1)

Country Link
JP (1) JPS5740845A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0746586B2 (ja) * 1985-10-18 1995-05-17 株式会社日立製作所 イオン源
JPH0711072B2 (ja) * 1986-04-04 1995-02-08 株式会社日立製作所 イオン源装置
JPH088072B2 (ja) * 1986-07-03 1996-01-29 日本真空技術株式会社 イオン源
JP2794602B2 (ja) * 1989-02-28 1998-09-10 東京エレクトロン株式会社 電子ビーム励起イオン源
JP2733628B2 (ja) * 1990-02-07 1998-03-30 東京エレクトロン株式会社 イオン発生装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5318677A (en) * 1976-08-04 1978-02-21 Sumitomo Electric Industries Process for making plastic containers

Also Published As

Publication number Publication date
JPS5740845A (en) 1982-03-06

Similar Documents

Publication Publication Date Title
US4713585A (en) Ion source
JP2648235B2 (ja) イオン銃
US4851668A (en) Ion source application device
RU2167466C1 (ru) Плазменный источник ионов и способ его работы
JPH0222500B2 (en])
JP3111851B2 (ja) 高磁束密度イオン源
JP3989507B2 (ja) ガス原子内包フラーレンの製造装置及び製造方法並びにガス原子内包フラーレン
JP2849771B2 (ja) スパッタ型イオン源
JP2552701B2 (ja) イオン源
JPH0746586B2 (ja) イオン源
KR920003157B1 (ko) PIG(Penning Ionization Gause)형의 이온원
JPH0129296B2 (en])
GB1567312A (en) Ion source
JPH0752635B2 (ja) イオン源装置
JP2586836B2 (ja) イオン源装置
JP3045619B2 (ja) プラズマ発生装置
JPH0626197B2 (ja) ドライエッチング装置
JP2848590B1 (ja) 電子ビーム励起プラズマ発生装置
JP2637947B2 (ja) ビームプラズマ型イオン銃
JPH024979B2 (en])
JPH06101307B2 (ja) 金属イオン源
JPS58154200A (ja) Ｘ線露光装置
JPH0695501B2 (ja) エッチング方法
JPH0554812A (ja) イオン源
JPS5675573A (en) Ion etching method